Press Releases

Responding to requirements for further purification and quality stabilization of ultrapure water from semiconductor and wafer manufacturers, Kurita Water Industries Ltd. (Head Office: Shinjuku-ku Tokyo, President: Hiroshi Saito) has constructed a high-performance resin (ion-exchange polisher) and membrane (UF membrane module) refining plant for next-generation level ultrapure water in its Shizuoka Plant.
The completion of the plant has enabled the company to guarantee a metallic ion concentration of 0.1 ppt or less in product water before shipment, thus meeting, for the first time globally, the standard required for next-generation ultrapure water.

In recent years, progress in downsizing the feature sizes of, large-capacity semiconductor devices has led to strong demand for further purification and quality stabilization of ultrapure water. The cutting-edge manufacturing techniques for 32-nm Class or later semiconductor devices, in particular, require stabilized ultrapure water with a metallic ion concentration level of 0.1 ppt or less, as an indispensable prerequisite. These needs from our clients for higher purification and quality stability have also presented us with the challenge of improving the quality of ion-exchange resins and UF membranes, which are key components for ultrapure water production systems.
When conventional ion-exchange resins or UF membrane modules are applied to ultrapure water production systems, a period of time is required before stable and satisfactory quality of ultrapure water, necessary for most advanced semiconductor manufacturers, is achieved.
To improve cleanness, these ion-exchange resins and UF membranes must be purified before shipment to remove impurities that may possibly pollute the ultrapure water.

The new High Performance Resin and Membrane Refining Plant features a world-leading manufacturing system in a clean environment, and an advanced analytical/inspection system for ultra-trace impurity metals. High-performance resins and membranes refined in our facilities are extremely clean, and will be supplied to the market as products of stabilized quality.
To eliminate contaminants thoroughly, the refining process consists of a brand-based dedicated "Line-transportation system" that prevents resins from being exposed to the air at all stages, from acceptance of raw materials to refining, storage, measuring, mixing, filling, and inspection.
And samples for trace impurities analysis are supplied directly to a clean room in sampling tubes that allow for ultra trace analysis without risk of contamination.
Thus, quality control is thoroughly conducted.

Supplementary material

Outline of High Performance Resin and Membrane Refining Plant

1. Name:
   High Performance Resin and Membrane Refining Plant
2. Established:
   April 2009
3. Location:
   Shizuoka Plant
   1060, Kawashiri, Yoshidacho, Haibara-gun, Shizuoka 421-0302
   TEL: 0548-33-1211
4. Facilities:
   4-story steel-framed building with clean rooms
   (Gross floor area: 2,600 m²)
5. Plant personnel:
   30
6. Products:
   High-performance resin (ion-exchange polisher), High-performance membrane (UF membrane module), functional water refinery, etc.
7. Shipping schedule:
   September 2009
8. Plant pictures: